发明名称 SILVER ALLOY, SPUTTERING TARGET THEREOF AND THIN FILM THEREBY
摘要 <P>PROBLEM TO BE SOLVED: To provide an Ag-Ge based silver alloy capable of depositing a reflective electrode film having the characteristics that yellowing caused by sulfurization is hard to be generated, and deterioration in reflection is extremely reduced not only at ordinary temperature but also in a heating stage in a production process of a color liquid crystal display. <P>SOLUTION: The silver alloy essentially consists of Ag. For imparting sulfurization resistance thereto, at least 0.01 to 10.0wt% Ge is incorporated into the Ag alloy. Further, for imparting the other characteristics thereto, Ge, and at least one kind selected from typical metallic elements, semimetal elements and transition metal elements are incorporated into the Ag alloy by 0.01 to 10.0wt% in total. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006037169(A) 申请公布日期 2006.02.09
申请号 JP20040219280 申请日期 2004.07.27
申请人 FURUYA KINZOKU:KK 发明人 WATANABE ATSUSHI
分类号 C22C5/06;C23C14/34;G02B5/08;G02B5/20;G11B7/24;G11B7/258;H01L51/50;H05B33/14;H05B33/26 主分类号 C22C5/06
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