发明名称 PRETREATMENT METHOD FOR ELECTROLESS PLATING, AND ELECTROLESS PLATING METHOD INCLUDING THE PRETREATMENT METHOD
摘要 PROBLEM TO BE SOLVED: To improve adhesiveness of metallic nuclei to the surface of a substrate while affecting a substrate material little, by reducing a metallic complex carried on the surface of the substrate at a low temperature with a reducing agent to form the metallic nuclei containing no thermal decomposition residue on the surface of the substrate. SOLUTION: This pretreatment method comprises the steps of: first, contacting the substrate 11 with a subcritical fluid or a supercritical fluid having the metallic complex 12 containing the same metal as a plating metal dissolved therein to degrease and etch the surface of the substrate 11, and at the same time, to make the surface of the substrate 11 carry the metallic complex 12; and next, reducing the metallic complex 12 carried on the surface of the substrate 11 with the use of the reducing agent, and thereby depositing the metal in the metallic complex 12 on the surface of the substrate 11 to form the metallic nuclei 13 on it. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006037188(A) 申请公布日期 2006.02.09
申请号 JP20040221121 申请日期 2004.07.29
申请人 MITSUBISHI MATERIALS CORP 发明人 DEN TAKEYOSHI;YAMANO YUURIKEI;HATAKEYAMA KO;SHINOHARA KATSUNORI;MAEDA TAKESUKE
分类号 C23C18/30;C23C18/22 主分类号 C23C18/30
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