| 摘要 |
Methods for producing a hologram mask approximating the exposure produced by a non-holographic phase shifting photo mask are disclosed. One such method exposes a hologram recording material to a first object light, having passed through a first original mask and a first reference light having a difference in phase with the first object light, and further exposing the hologram recording material to a second object light, having passed through a second original mask and a second reference light having a difference in phase with the second object light, wherein first and second phase differences are not the same and wherein the exposed hologram material can be replayed to produce an exposed pattern that approximates an exposed pattern of a non-holographic phase shifting photomask.
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