ELECTRON EMISSION DEVICE AND MEHTOD OF MANUAFACUTRING THE SAME

摘要

In a method of manufacturing an electron emission device, cathode electrodes are first formed on a substrate. An insulating layer is formed on the entire surface of the substrate such that the insulating layer covers the cathode electrodes. The insulating layer is wet-etched two or more times such that openings each with an aspect ratio of more than 1 are formed in the insulating layer. Gate electrodes are formed on the insulating layer. Electron emission regions are formed on the cathode electrodes within the openings of the insulating layer. The respective etchings are conducted using separate mask patterns with the same-sized openings such that under-cuts are made.