| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithographic system and a manufacturing method of the lithographic system capable of preventing the contamination of a projection optical system. <P>SOLUTION: The lithographic apparatus has a support configured so as to support a patterning device capable of forming a patternized radiation beam by giving a pattern to the section of the radiation beam. A projection system is configured so as to project the patternized radiation beam to the target portion of a substrate. The projection system is included in a first vacuum environment and a patterning device support is included in a second vacuum environment, the separator divides the first vacuum environment from the second vacuum environment. The separator has an opening from the first vacuum environment to the patterning device and/or reversely, an opening through which the projected beam is allowed to pass. The patterning device forms at least a part of seal that almost seals the opening of the separator. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
