| 摘要 |
An exposure method immerses, in liquid, a surface of an object to be exposed, and a surface of a projection optical system closest to the object, and projects a repetitive pattern formed on a mask via the projection optical system onto the object. The exposure method forms on a pupil of the projection optical system an effective light source that emits, from an axis orthogonal to an optical axis of the projection optical system, light that is parallel to a repetitive direction of the repetitive pattern and has an incident angle theta upon the object, wherein the light includes only s-polarized light in an area of an incident angle theta that satisfies 90°-theta<SUB>NA</SUB><=theta<=theta<SUB>NA</SUB>, where theta<SUB>NA </SUB>is the largest value of the incident angle theta.
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