发明名称 LIQUID DROPLET JET DEVICE USING CHARGED PARTICLE BEAM AND METHOD FOR FORMING PATTERN USING THE DEVICE
摘要 <p>The precision of landing of a liquid droplet jetted out by a liquid droplet jet method is greatly improved and a fine, highly precise pattern is formed directly on a substrate. A method for fabricating a wiring, a conductive layer and a display adaptable to a larger-size substrate and a method for fabricating a wiring, a conductive layer and a display in which the throughput and the efficiency of use of materials are improved are also disclosed. The liquid droplet landing precision is greatly improved when mainly the resist material or the wiring material is directly patterned on a substrate having an insulation surface by a liquid droplet jet method. Specifically, the invention is characterized in that immediately before a liquid droplet is jetted by a liquid droplet jet method, the liquid droplet landing position on the substrate is scanned with a charged beam according to a desired pattern, and right after this scanning, the liquid droplet is given a charge with a sign opposite to that of the charged beam and jetted out, thereby greatly improving the controllability of the liquid droplet landing position.</p>
申请公布号 KR20060009273(A) 申请公布日期 2006.01.31
申请号 KR20057020259 申请日期 2004.04.07
申请人 SEMICONDUCTOR ENERGY LABORATORY K.K. 发明人 IMAI KEITARO;YAMAZAKI SHUNPEI
分类号 B41J2/08;B05B5/025;B05B5/053;B05B12/12;B05C5/00;B05C5/02;B41J2/085;B41J2/09;H01L21/26;H01L21/324;H01L21/42;H01L21/477 主分类号 B41J2/08
代理机构 代理人
主权项
地址