发明名称 |
CERIUM POLISHING AGENT AND METHOD FOR PRODUCING CERIUM POLISHING AGENT |
摘要 |
A cerium polishing agent containing lanthanum is characterized in that the Ce/La ratio (S) in the surface of a polishing particle is greater than the Ce/La ratio (B) of the whole polishing particle, namely (S>B). Such a cerium polishing agent can be produced by adding a step to the conventional methods for producing a cerium polishing agent for removing lanthanum-containing compound particles from a slurry after wet processing. The lanthanum-containing compound particles can be removed by adding a solution such as a mineral acid or a chelating agent, in which lanthanum hydroxide or lanthanum oxide is soluble, to the slurry.
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申请公布号 |
KR20060009230(A) |
申请公布日期 |
2006.01.31 |
申请号 |
KR20057010157 |
申请日期 |
2005.06.03 |
申请人 |
MITSUI MINING & SMELTING CO., LTD. |
发明人 |
OGURA SHUJI;WATANABE HIROYUKI |
分类号 |
C09K3/14;C03C19/00 |
主分类号 |
C09K3/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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