发明名称 INFILTRIERTE NANOPORÖSE MATERIALIEN UND VERFAHREN ZU DEREN HERSTELLUNG
摘要 <p>In accordance with the present invention, a low dielectric constant structural layer is produced having increased mechanical strength and having a plurality of voids that comprises a substrate layer; a low dielectric structural layer juxtaposing the substrate layer; and an infiltrating layer comprising an infiltrating material having a volatile component and a reinforcing component juxtaposing the structural layer and coating at least some of the plurality of voids. Also, methods are provided in which the mechanical strength of a structural layer having a plurality of voids is increased by a) depositing the structural layer on a substrate layer; b) providing an infiltrating material having a volatile component and a reinforcing component; c) introducing the infiltrating material into at least some of the plurality of voids; and d) treating the infiltrating material such that the structural strength is increased by a substantial amount.</p>
申请公布号 DE60019149(T2) 申请公布日期 2006.01.26
申请号 DE2000619149T 申请日期 2000.10.17
申请人 ALLIEDSIGNAL INC., MORRISTOWN 发明人 LEUNG, ROGER;SCHAEFER, DAVID;SIKONIA, JOHN
分类号 H01L21/312;H01B3/30;H01L21/316;H01L23/498;H01L23/522;H01L23/532 主分类号 H01L21/312
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