发明名称 POLISHING PAD AND METHOD FOR MANUFACTURING POLISHING PAD
摘要 <P>PROBLEM TO BE SOLVED: To provide a polishing pad capable of performing polishing with high flatness having a structure of a laser beam transmission window allowing observation of a polishing condition for a workpiece to be polished by the use of a laser beam while preventing the window member of the laser beam transmission window from inhibiting the flow of polishing slurry, and to provide a method for manufacturing the polishing pad. <P>SOLUTION: This polishing pad 4 is provided with grooves 11, 12 for retaining the polishing slurry on the surface side serving as a polishing surface, and the laser beam transmission window with the window member 10 buried therein. The window member 10 is provided with the groove 12 on its surface, and is configured to be a part of the polishing surface. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006021290(A) 申请公布日期 2006.01.26
申请号 JP20040203155 申请日期 2004.07.09
申请人 NITTA HAAS INC 发明人 IKUOKA MASAHIKO;TANAKA SUKENORI
分类号 B24B37/013;B24B37/20;H01L21/304 主分类号 B24B37/013
代理机构 代理人
主权项
地址
您可能感兴趣的专利