| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive composition in which occurrence of development defects is suppressed even when it is used in pattern formation after long-term storage, and which ensures excellent following property of an immersion liquid, and to provide a pattern forming method using the composition. <P>SOLUTION: The photosensitive composition contains (A) a resin having a specific group containing at least one halogen atom at at least one terminal of a molecular chain and having a dissolution rate in an alkaline developer increased by the action of an acid, and (B) a compound which generates an acid upon irradiation with an actinic ray or a radiation. The pattern forming method using the composition is also provided. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
