| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an aligner to efficiently expose a wide exposure region using a small mask. <P>SOLUTION: The aligner 1 is equipped with an exposure optical system 2 which irradiates a color filter substrate 6 with exposure light from a light source 7 and with a carrying means which is disposed facing the exposure optical system 2 and which mounts and carries the color filter substrate 6 at a constant speed, and the aligner transfers the image on of an opening part 10a of a mask 10 inserted on the optical path of the exposure optical system 2 onto the color filter substrate 6. The aligner is also equipped with an imaging means 3, which images a black matrix 11 preliminarily formed on the color filter substrate 6 in an imaging position, prior to the exposure position by the exposure optical system in the moving direction of the carrying means 4, and with a control means 5 which detects a reference position preliminarily determined in the black matrix 11 imaged by the imaging means 3, controls irradiation timing of the exposure light by the exposure optical system 2 based on the reference position, and transfers the image of the opening part 10a of the mask 10 onto a prescribed position of the color filter substrate 6. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
