POSITIVE RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a positive resist composition with a wide DOF (depth of focus) and a method for forming a resist pattern.

SOLUTION: The positive resist composition contains (A) a resin component the alkali solubility of which increases by an effect of an acid and (B) an acid generating agent component which generates an acid by exposure. The component (A) is a copolymer comprising n (n is an integer 4 to 6) kinds of structural units having different structures from one another, wherein the proportion of each structural unit in the copolymer is over 0 mol% to 100/(n-1) mol% or lower.

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