| 摘要 |
PROBLEM TO BE SOLVED: To provide a water-soluble fine pattern forming material which does not dissolve a base resist for realizing a fine separation resist pattern, capable of forming a pattern which exceeds the wavelength limit to minimize separation pattern or hole pattern. SOLUTION: The fine pattern forming material contains a composition, comprising essentially of a water-soluble organic compound having a cationic group and water or a mixed solvent of water and a water-soluble organic solvent for dissolving this composition. The cationic group in the water-soluble organic compound reacts with an anionic group in a resist pattern essentially comprising a compound, having an anionic group to produce a salt, which results in the formation of insoluble film. COPYRIGHT: (C)2006,JPO&NCIPI |
