发明名称 PHOTORESIST COMPOSITIONS
摘要 The present invention relates to a composition and a process for preparing a composition that comprises: a) a novolak resin partially esterified with from about 3 to about 7 weight percent of a naphthoquinonediazidosulfonyl group; b) one or more dilution resins; and c) at least one solvent.
申请公布号 KR20060005349(A) 申请公布日期 2006.01.17
申请号 KR20057018382 申请日期 2005.09.28
申请人 AZ ELECTRONIC MATERIALS USA CORP. 发明人 EILBECK J. NEVILLE
分类号 G03F7/023;G03C1/76;G03F7/00;G03F7/004;G03F7/022 主分类号 G03F7/023
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