| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive composition which has small surface tackiness, good suitability to lamination and handling and excellent storage stability, exhibits excellent chemical and heat resistances after development, and reconciles surface hardness with brittleness; a photosensitive film using the composition; a high-definition permanent pattern; and a method for efficiently forming the pattern. <P>SOLUTION: The photosensitive composition contains at least a copolymer obtained by reacting anhydride groups of a maleic anhydride copolymer with 0.1-1.2 equivalent of a primary amine compound and having electron-donating vinyl groups or electron-accepting vinyl groups, a compound having reactivity with the copolymer and having at least two electron-accepting vinyl groups or electron-donating vinyl groups, a polymerizable compound, and a photopolymerization initiator. The primary amine compound preferably has an electron-donating vinyl group and the compound having reactivity preferably contains electron-accepting vinyl groups. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
