METHOD FOR PRODUCING MARKER ON SUBSTRATE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a method and an apparatus which enables more accurate alignment in a smaller time.

SOLUTION: The method of producing a marker (11) on a substrate (W) includes projecting a patterned beam on a layer (R) of resist disposed on the substrate (W) in a lithographic apparatus to create a latent marker (10); and locally heating the substrate (W) at the marker location in the lithographic apparatus to transform the latent marker (10) into a detectable marker (11).

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