LITHOGRAPHIC PROJECTION APPARATUS, METHOD OF MANUFACTURING DEVICE, AND DEVICE MANUFACTURED THEREBY

摘要

PROBLEM TO BE SOLVED: To provide a lithographic projection apparatus, in which a radiation sensor, which can detect the radiation having a wavelength shorter than 50 nm and has been disadvantageous for use in a lithographic projection apparatus of prior art, is positioned advantageously.

SOLUTION: The lithographic projection apparatus comprises a radiation system for providing a projection beam of radiation having a wavelength λ1smaller than 50 nm, a support structure for supporting the patterning means that serves to pattern the projection beam according to a desired pattern, a substrate table for holding a substrate, and a projection system for projecting the patterned beam onto a target portion of the substrate. The apparatus further comprises a radiation sensor, located so as to be able to receive radiation out of the projection beam and composed of a radiation-sensitive material which converts incident radiation of wavelength λ1into a secondary radiation, and a sensing means capable of detecting the secondary radiation emerging from the layer of the radiation-sensitive material.

COPYRIGHT: (C)2006,JPO&NCIPI