ELECTROSTATIC CHUCK

摘要

PROBLEM TO BE SOLVED: To provide an electrostatic chuck without the danger of electric breakdown even when a voltage application/removal cycle, wherein a voltage of 1 kV is applied by a single electrode for one minute and then this voltage is removed, is repeated. SOLUTION: In the electrostatic chuck 1, one main surface of a plate-shaped ceramic member 2 is used as a placement surface 2a for a wafer, and an electrode 3 is provided on the other main surface of or within the plate-shaped ceramic member 2. The mean distance between the electrode 3 and the wafer placement surface 2a is≥0.015 cm, the product of the volume resistivity value of a dielectric layer 2b between the electrode 3 and the placement surface 2a and that mean distance is 1×107to 5×1016Ωcm2, the mean particle diameter of aluminum nitride forming the dielectric layer 2b is 1-20μm, and the open pore ratio of the dielectric layer 2b is≤1%. COPYRIGHT: (C)2006,JPO&NCIPI