| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method for increasing the polishing speed for a substrate to be polished while improving the smoothness of the surface to be polished, a manufacturing method of the substrate using the same method, which is excellent in surface smoothness and productivity, and a polishing fluid composition which can manufacture a glass memory hard disk substrate having excellent surface smoothness at a high polishing speed. <P>SOLUTION: The method for increasing the polishing speed for the substrate to be polished uses the polishing fluid composition containing aqueous media and silica particles, in which aζ-potential of the silica particles is adjusted to -15 to 40 mV. The method for manufacturing the substrate uses the same method described above. The grinding fluid composition for polishing the glass memory hard disk contains the aqueous media and the silica particles having aζ-potential of -15 to 40 mV. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
