| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for obtaining a resist image a resist image having proper chemical resistance with respect to the treatment agent of degreasing process, practically sufficient adhesiveness with a substrate to be processed, and further superior separability of resist, in an image forming method using a resist image formation material obtained, by making the image formation material, such as a dry film, adhere to the substrate to be processed by a method of laminate or the like. <P>SOLUTION: In the method for forming the resist image by developing the rest image formation material, after exposing the resist image formation material obtained by adhering a photopolymerizable composition face of the resist image forming material, having a layer of a photopolymerizable composition so as to be contacted on the substrate to be processed, the resist image forming method conducts full surface exposure of a resist image forming face of the resist image obtained by development. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
