发明名称 Apparatus to dry substrates
摘要 The present invention disclosed herein is an apparatus for drying a substrate. In accordance with the present invention, the apparatus includes a measuring unit to detect a density of IPA vapor at predetermined regions in a process chamber or a pipe. The measuring unit has a radiating unit, a detection unit, and a window unit. The radiating unit transmits infrared-ray in a wavenumber region where light is absorbed by the IPA vapor.
申请公布号 US2006005422(A1) 申请公布日期 2006.01.12
申请号 US20050142335 申请日期 2005.06.02
申请人 YI HUN-JUNG 发明人 YI HUN-JUNG
分类号 F26B13/10;F26B19/00 主分类号 F26B13/10
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