发明名称 Photosensitive resin composition
摘要 <p>A photosensitive resin composition which enables the formation of a pattern manifesting large elastic deformation ratio and small plastic deformation ratio in a wider temperature range, and a color filter which enables the production of a liquid crystal display having a columnar convex part for setting the thickness of a liquid crystal layer and having excellent display qualities are provided. A photosensitive resin composition comprises at least a polymer, a poly-functional acrylate monomer and a photopolymerization initiator, wherein the content of the poly-functional acrylate monomer is from 50 to 70% by weight. A photosensitive resin composition comprises at least a polymer, a monomer having an unsaturated double bond, a photopolymerization initiator, and an alicyclic compound-containing resin, wherein the alicyclic compound is a compound having a poly-cyclic steric structure. A color filter comprises a colored layer a plurality of colors formed on a substrate in a predetermined pattern, and a plurality of columnar convex parts, wherein the columnar convex part manifests an elastic deformation ratio [(elastic deformation amount/total deformation amount)×100] ranging from 40 to 60% and an initial deformation ratio [(initial deformation amount/original thickness)×100] ranging from 10 to 30%, at a temperature of 180°C.</p>
申请公布号 EP1615072(A2) 申请公布日期 2006.01.11
申请号 EP20050022329 申请日期 2001.09.28
申请人 DAI NIPPON PRINTING CO., LTD. 发明人 SUMINO, TOMONOBU;INOUE, AKIRA
分类号 G03F7/00;G03F7/004;C08F2/44;C08F2/50;C08F291/00;G02B5/00;G02B5/20;G02F1/1335;G02F1/1339;G03F7/027;G03F7/028;G03F7/033;G03F7/038;G03F7/26 主分类号 G03F7/00
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