Method for forming a trench in semiconductor device,申请号KR20030049293-传众专利搜索

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发明名称	Method for forming a trench in semiconductor device
摘要
申请公布号	KR100542716(B1)	申请公布日期	2006.01.11
申请号	KR20030049293	申请日期	2003.07.18
申请人		发明人
分类号	H01L21/76	主分类号	H01L21/76
代理机构		代理人
主权项
地址

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