| 摘要 |
<P>PROBLEM TO BE SOLVED: To form a resist pattern having high resolution and low LER (line edge roughness). <P>SOLUTION: A chemically amplified positive resist composition contains a copolymer (A1) having (a1) a structural unit derived from a mono(α-lower alkyl)acrylate having an acid dissociable solubility suppressing group, (a2) a structural unit derived from a mono(α-lower alkyl) acrylate having a lactone-containing monocyclic or polycyclic group, and (a4) a structural unit derived from a poly (α-lower alkyl) acrylate comprising a precursor unit derived from an (α-lower alkyl) acrylate having a polycyclic alicyclic hydrocarbon group containing a hydroxyl group or a carboxyl group, wherein a crosslinking group expressed by general formula (I) is substituted for a hydrogen atom in the hydroxyl group or the carboxyl group and forms an intramolecular or intermolecular crosslink. In formula (I), A represents a bivalent or trivalent organic group, p represents an integer 1 to 3, and each of R<SP>1</SP>and R<SP>2</SP>independently represents a hydrogen atom or a straight or branched lower alkyl group. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
