| 摘要 |
The magnetic head includes a second magnetic shield that is fabricated in a deposition process. The present invention therefore does not require the deposition of the electrically conductive seed layer. In a preferred embodiment, the deposited second magnetic shield is comprised of cobalt zirconium tantalum (CZT). Because the CZT material is relatively soft, it is preferably deposited within an opening formed in a relatively hard RIEable material such as Ta<SUB>2</SUB>O<SUB>5</SUB>, SiO<SUB>2</SUB>, Si<SUB>3</SUB>N<SUB>3</SUB>, and SiO<SUB>x</SUB>N<SUB>y</SUB>, such that a subsequent chemical mechanical polishing (CMP) step can be conducted down to the surface of the relatively hard layer.
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