| 摘要 |
PROBLEM TO BE SOLVED: To obtain high sensitivity regardless of the kind of a sample and the surface state of the sample. SOLUTION: The total reflection fluorescent X-ray analyzing method includes a process for exposing a semiconductor substrate 2 to acid vapor, a process for scanning and recovering impurities on the surface of the semiconductor substrate exposed to the acid vapor by an acid solution, a process for concentrating and drying the scanned and recovered acid solution 6 on a substrate of which the surface is a mirror surface state to convert the same to concentrated dry matter 8, a process for changing the concentrated dry matter to a granular concentrate 8a using an acid and a process for analyzing the granular concentrate by a total reflection fluorescent X-ray analyzer 40. COPYRIGHT: (C)2006,JPO&NCIPI |
