发明名称 Use of voids between elements in semiconductor structures for isolation
摘要 A flash EEPROM or other type of memory cell array having adjacent charge storage elements is formed with a gas filled void between them in order to reduce the level of capacitive coupling between storage elements, thus reducing cross-coupling between charge storage elements and resulting errors occurring in the data read from the array.
申请公布号 US2006001073(A1) 申请公布日期 2006.01.05
申请号 US20050210218 申请日期 2005.08.22
申请人 CHEN JIAN;HIGASHITANI MASAAKI 发明人 CHEN JIAN;HIGASHITANI MASAAKI
分类号 H01L29/76;H01L21/768;H01L21/8247;H01L23/522;H01L27/115 主分类号 H01L29/76
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