发明名称 Process for producing plasma display panel and apparatus therefor
摘要 A method for depositing a high quality metal oxide film onto a substrate of a plasma display panel is provided. At a process for forming protective layer ( 8 ) of MgO film which is a metal oxide film, the film is formed in such a manner that partial pressure of oxygen gas or the like in evaporation room ( 21 ) which is a deposition room is within a certain range. Using this method, deposition is performed with an atmosphere in evaporation room ( 21 ) constant, so that physical properties of a film can be stabilized. As a result, a plasma display panel which can display high quality images can be manufactured.
申请公布号 US2006003087(A1) 申请公布日期 2006.01.05
申请号 US20050532673 申请日期 2005.04.26
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 发明人 TAKASE MICHIHIKO;OE YOSHINAO
分类号 H01J9/00;C23C16/00;H01J9/02;H01J9/24 主分类号 H01J9/00
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