PLASMA PROCESSING EQUIPMENT

摘要

A plurality of concentric ring-shaped slots (300-304) are formed on a planar antenna member (3), conductors (310, 311) at a center part are formed relatively thin, and conductors (312-315) at the peripheral part are formed relatively thick. Thus, microwaves pass through more easily without being attenuated by the slots (300-304), uniform electric field distribution can be obtained, and high density plasma can be generated uniformly in average in a processing space. Therefore, an object to be processed can be brought close to the antenna member (3), and the object to be treated can be uniformly processed at a high speed.