| 摘要 |
Exposure equipment which can prevent generation of troubles due to a flowed out liquid. The exposure equipment is provided with a substrate holder (PH) and a recovery mechanism. The substrate holder is provided with a supporting part (34) arranged on a circumference wall part (33) and a supporting part (34) arranged inside the circumference wall part (33), and supports a substrate (P) by having a space (31) surrounded by the circumference wall part (33) under a negative pressure. The recovery mechanism is provided with a recovery port (61) provided inside the circumference wall part (33), and a vacuum system (63) connected with the recovery port (61). Under the condition where an upper plane (33A) of the circumference wall part (33) and a rear plane (Pb) of the substrate (P) are separated at a first distance, a liquid (LQ) entered from an outer circumference of the substrate (P) is recovered by suction. |
