发明名称 Method of manufacturing a semiconductor device
摘要 <p>The present invention supplies a manufacturing method of a semiconductor device, which includes a non-contact inspection process capable of confirming if a circuit or circuit element formed on an array substrate is normally performed and can decrease a manufacturing cost by eliminating wastes to keep a defective product forming. An electromotive force generated by electromagnetic induction is rectified and shaped by using primary coils formed on a check substrate and secondary coils formed on an array substrate, whereby a power source voltage and a driving signal are supplied to circuits or circuit elements on a TFT substrate so as to be driven.</p>
申请公布号 SG117406(A1) 申请公布日期 2005.12.29
申请号 SG20020001419 申请日期 2002.03.13
申请人 MICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 MASAAKI HIROKI;SHUNPEI YAMAZAKI
分类号 G02F1/1368;G09F9/00;G09G3/00;H01L21/336;H01L21/66;H01L21/77;H01L21/84;H01L27/12;H01L27/13;H01L29/786;(IPC1-7):H01L21/66 主分类号 G02F1/1368
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