发明名称 Surface modification of a porous organic material through the use of a supercirtical fluid
摘要 <p>An organic layer, such as a porous low-K dielectric in an IC, contains pores open at its surface. To close the pores, the organic layer is contacted by a supercritical fluid that is a solvent for the layer. After a small amount of the surface and the wall of the open pores is solvated, a phase transition of the solvated organic material is effected at the surface to cover it with a dense, smooth, non-porous film that seals the open pores.</p>
申请公布号 SG117511(A1) 申请公布日期 2005.12.29
申请号 SG20040007330 申请日期 2004.12.10
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 CHING-YA WANG;PING CHUANG;SUNNY WU;YU-LIANG LIN;HUNG-JUNG TU;MEI-SHENG ZHOU;HENRY LO
分类号 B05D3/04;B05D5/12;B32B3/26;C08K3/00;H01L21/3105;H01L21/312;H01L21/316 主分类号 B05D3/04
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