METHOD FOR THE SELECTIVE DEPOSITION OF A GALVANIC COATING ON A MINIATURISED ELECTRIC CIRCUIT CREATED BY ETCHING

摘要

The invention relates to a method comprising the following steps: a layer of a photosensitive product (2) is deposited on a full metallic strip (1); a first mask comprising a plurality of windows is positioned against said layer of photosensitive product (2); part of said photosensitive layer (2) is isolated and then developed in such a way as to generate holes therein (2), the bottom of the holes being formed by the upper side of the metallic strip (1); at least one layer of galvanic coating (5) is deposited inside the holes on contact with the metallic strip (1); a protective layer (6) is deposited on the upper side of the galvanic coating layer (5); a second mask (13) comprising a plurality of windows (18) is positioned against the layer of photosensitive product (2); part of the photosensitive layer (2) is isolated and then developed in such a way that the upper side is locally revealed; the metallic strip (1) is etched on the upper side in such a way as to eliminate part of the metallic strip (1) and to form conductor strips (1); and the layer of photosensitive product (2) and the protective layer (6) are completely dissolved in order to maintain only the conductor strips (1) comprising a plurality of bonding pads (5) formed by at least one galvanic coating layer (5).