| 摘要 |
A calibration method for calibrating a stage position includes projecting a pattern of a patterning device onto a substrate; measuring a resulting position of the projected pattern; and deriving a calibration of the stage position from the measured position, wherein, during the measuring, the substrate is rotated from a rotational starting position towards at least one other rotational position around a centre axis of the substrate, and a position of the projected pattern is measured for each of the at least two different rotational positions of the substrate, and wherein at least one of projection deviations in a position of the pattern occurring during the projecting and measurement deviations in a position of the pattern occurring during the measuring is determined by averaging the measured positions of the projected pattern for each of the different rotational positions of the substrate.
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