发明名称 |
CONTACT HOLE PRINTING METHOD AND APPARATUS WITH SINGLE MASK, MULTIPLE EXPOSURES, AND OPTIMIZED PUPIL FILTERING |
摘要 |
The present invention provides a lithographic method and apparatus (e.g., for printing contact holes on a wafer) that use a single mask, multiple exposures, and optimized pupil filtering. The method comprises: providing a mask including pattern features to be transferred to a wafer; transferring a first set of pattern features from the mask to the wafer using a first type of illumination and a first type of pupil filter; and transferring a second set of pattern features from the mask to the wafer using a second type of illumination and a second type of pupil filter.
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申请公布号 |
US2005287483(A1) |
申请公布日期 |
2005.12.29 |
申请号 |
US20040710168 |
申请日期 |
2004.06.23 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
LERCEL MICHAEL;ROSENBLUTH ALAN E.;SEONG NAKGEUON |
分类号 |
G03C5/00;G03F1/14;G03F7/20;(IPC1-7):G03F7/20 |
主分类号 |
G03C5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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