PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION EQUIPMENT PROVIDED WITH COLLIMATOR,申请号KR20040046700-传众专利搜索

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发明名称	PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION EQUIPMENT PROVIDED WITH COLLIMATOR
摘要
申请公布号	KR20050121539(A)	申请公布日期	2005.12.27
申请号	KR20040046700	申请日期	2004.06.22
申请人	HYNIX SEMICONDUCTOR INC.	发明人	LEE, HOON
分类号	H01L21/205;(IPC1-7):H01L21/205	主分类号	H01L21/205
代理机构		代理人
主权项
地址

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