| 发明名称 |
APPARATUS, SYSTEM AND METHOD TO VARY DIMENSIONS OF A SUBSTRATE DURING NANO-SCALE MANUFACTURING |
| 摘要 |
The present invention is directed toward an apparatus, system and method to vary dimensions of a substrate, such as a template having a patterned mold. |
| 申请公布号 |
WO2005121892(A2) |
申请公布日期 |
2005.12.22 |
| 申请号 |
WO2005US18991 |
申请日期 |
2005.06.01 |
| 申请人 |
MOLECULAR IMPRINTS, INC. |
发明人 |
CHERALA, ANSHUMAN;CHOI, BYUNG-JIN;NIMMAKAYALA, PAWAN K.;MEISSL, MARIO J.;SREENIVASAN, SIDLGATA V. |
| 分类号 |
B29C43/02;B81C99/00;G03B27/58;G03F7/00 |
主分类号 |
B29C43/02 |
| 代理机构 |
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代理人 |
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