发明名称 PARTS OF SUBSTRATE TREATMENT APPARATUS, AND MANUFACTURING METHOD THEREFOR
摘要 <P>PROBLEM TO BE SOLVED: To provide parts to be used in a substrate treatment apparatus, which prevent particles from forming in a substrate treating apparatus, and have improved corrosion resistance to a corrosive gas such as a fluorine-based gas and a chlorine-based gas. <P>SOLUTION: The parts of the substrate treatment apparatus have a thermal-sprayed film consisting of metallic silicon and silica covering a base material, wherein the thermal-sprayed film contains 1 to 50 wt.% metallic silicon. The method for manufacturing the parts provided with the thermal-sprayed film comprises using metallic silicon as a thermal spraying powder and a nitrogen-containing gas as a plasma gas, and plasma-spraying the powder onto the base material in the air or in an atmosphere containing oxygen. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005350685(A) 申请公布日期 2005.12.22
申请号 JP20040169780 申请日期 2004.06.08
申请人 TOSOH CORP 发明人 KIKUCHI RYO;KOGO MASANORI
分类号 B32B9/00;C23C4/04;C23C4/12;C23C4/18 主分类号 B32B9/00
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