发明名称 SEMICONDUCTOR LASER DEVICE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor laser device that is of high output and highly efficient and can suppress an increase in element resistance or differential resistance element due to discontinuity of a band even if a p-type layer is added with low diffusion, so as to establish an optional device characteristic, and to provide its manufacturing method. SOLUTION: In the semiconductor laser device, an n-type clad layer 5, an active layer 4 and a p-type clad layer 3 that are made of a group III-V compound semiconductor respectively are formed above a substrate 7 made of an n-type GaAs, and a cap layer 1 made of a p-type GaAs is formed on the p-type clad layer 3 with a p-type band discontinuity mitigation layer 2 made of a group III-V compound semiconductor in-between. The p-type clad layer 3, the p-type band discontinuity mitigation layer 2 and the p-type cap layer 1 are added with a p-type impurity lower in diffusion than Zn, e.g. Mg, and the p-type band discontinuity mitigation layer 2 has a p-type impurity concentration of 2.5×10<SP>18</SP>cm<SP>-3</SP>or more. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005353654(A) 申请公布日期 2005.12.22
申请号 JP20040169781 申请日期 2004.06.08
申请人 MITSUBISHI ELECTRIC CORP 发明人 ONO KENICHI;TAKEMI MASAYOSHI
分类号 H01S5/343;H01S5/00;H01S5/223;H01S5/30;(IPC1-7):H01S5/343 主分类号 H01S5/343
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