发明名称 |
Method for forming microlens of image sensor |
摘要 |
Disclosed is a method for forming a plurality of microlenses of an image sensor capable of making no gap between the plurality of the microlenses. The method for fabricating a microlens array includes the steps of: depositing a first photoresist layer on a semi-finished substrate; selectively patterning the first photoresist layer, thereby forming a first photoresist layer pattern; forming a plurality of first microlenses by flowing the first photoresist pattern; depositing a second photoresist layer on the first microlenses and the semi-finished substrate; forming a second photoresist pattern between the first microlenses by selectively patterning the second photoresist layer; and forming a plurality of second microlenses between the first microlenses by flowing the second photoresist pattern.
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申请公布号 |
US2005281942(A1) |
申请公布日期 |
2005.12.22 |
申请号 |
US20050094013 |
申请日期 |
2005.03.29 |
申请人 |
PARK JEONG-LYEOL;KIM NAM-SOO |
发明人 |
PARK JEONG-LYEOL;KIM NAM-SOO |
分类号 |
H01L27/146;B05D5/06;B05D5/12;G02B3/00;(IPC1-7):B05D5/06 |
主分类号 |
H01L27/146 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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