| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure device which constitutes a surface position detection system which reduces measurement error caused by fluctuation of atmosphere in the optical path of a surface position detection mechanism, by matching an optical path of the surface position detection system with a region for purging a projection optical system effectively. <P>SOLUTION: The device has an encircling member which almost encloses an optical path space between a projection optical system and a photosensitive substrate. In the encircling member, a holder holding an optical element, a gas supply port which blows inert gas opposite into the enclosing member in a scanning direction, the photosensitive substrate side edge face of the encircling member, and the photosensitive substrate, are disposed with a clearance. The exposure device discharges the inert gas from the clearance. The optical path of the surface position detection mechanism is disposed in a longitudinal direction of the encircling member parallel to the longitudinal direction of the purge region. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
