| 摘要 |
PROBLEM TO BE SOLVED: To obtain an intermediate material excellent in stability, mass productivity and handleability, comprising ultrafine particles of semiconductor improved in dispersibility. SOLUTION: Ultrafine particles of semiconductor during synthesis in the presence of a metal compound and a monomer are irradiated with light rays to produce a dispersion of the ultrafine particles of semiconductor, which is mixed with a polymer or a solution of a polymer to give a solution. This solution is mixed with a solvent which is a poor solvent to the polymer but is a good solvent to the metal compound to settle a precipitate. The precipitate is filtered off and dried under reduced pressure to give the objective ultrafine particles dispersed material of semiconductor. |
