Stencil mask and method of producing the same

摘要

A stencil mask has a thin film (11) having an aperture pattern (13). A material layer (14) having heat conductance higher than that of the thin film (11) is set in a region except for a portion (c) of outer edge of the aperture pattern (13) in the side of a principal surface of the thin film (11). The invention further relates to a method for producing such a stencil work.