发明名称 Pattern forming method and apparatus, and device fabrication method and device
摘要 The invention saves resources and energy. A cleaning/fluid-feeding head integrates a cleaning head portion and a fluid-feeding head portion. The cleaning head portion includes an organic substance cleaning unit, an inorganic substance cleaning unit, a rinsing unit and a drying unit. The organic substance cleaning unit, inorganic substance cleaning unit and rinsing unit selectively clean pattern forming regions on a substrate by feeding thereto a first cleaning fluid, second cleaning fluid and pure water, respectively. The drying unit dries the rinsed pattern forming regions by blowing hot air thereonto. The fluid-feeding head portion selectively feeds a liquid pattern forming material to the cleaned pattern forming regions.
申请公布号 US6977222(B2) 申请公布日期 2005.12.20
申请号 US20030368647 申请日期 2003.02.20
申请人 SEIKO EPSON CORPORATION 发明人 MORI YOSHIAKI
分类号 H05B33/10;B41J2/165;H01L21/288;H01L21/304;H01L21/306;H01L51/50;H05K3/10;H05K3/12;H05K3/26;H05K3/28;(IPC1-7):H01L21/44;H01L21/302;B05D1/32;C23C14/02 主分类号 H05B33/10
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