发明名称 Review work supporting system
摘要 An object of the present invention is to increase efficiency in review work by appropriately narrowing down review work that verifies shapes of visual defects relating to an enormous amount of defects detected by a visual inspecting apparatus with high sensitivity. In order to appropriately extract defect information from an inspecting apparatus, a filter function and a sampling function are prepared by unitizing the functions. As a result, defects as review targets are narrowed down and extracted automatically using the filter function and the sampling function in combination. In addition, sequencing the filter conditions and the sampling conditions and registering the sequence enables automatic filtering and sampling on the basis of information on a wafer as a review target, and thereby only defect information on the review target is extracted.
申请公布号 US6978041(B2) 申请公布日期 2005.12.20
申请号 US20020096917 申请日期 2002.03.14
申请人 HITACHI, LTD. 发明人 ISOGAI SEIJI;KOMURO HITOSHI;WADA HIDEO;SHODA KATSUHARU
分类号 G01N23/225;G01N21/956;G03F1/00;G03F7/20;G06T1/00;G06T7/00;H01L21/66;(IPC1-7):G06K9/00 主分类号 G01N23/225
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