发明名称 |
Alternating phase shift mask |
摘要 |
An alternating phase shift mask. The alternating phase shift mask includes a transparent substrate, a light-shielding layer disposed on the transparent substrate to define a transparent array consisting of a plurality of first phase rows and a plurality of second phase rows alternately interposed between the first phase rows. The alternating phase shift mask further comprises a phase interference enhancement feature disposed a predetermined distance from the outermost row of the transparent array, wherein the phases of the phase interference enhancement feature and the outermost row are reverse. |
申请公布号 |
US6977127(B2) |
申请公布日期 |
2005.12.20 |
申请号 |
US20020320243 |
申请日期 |
2002.12.16 |
申请人 |
WINBOND ELECTRONICS CORP. |
发明人 |
SHIAH CHII-MING;HSU YI-YU;TUNG YU-CHENG;LIAO HUNG-YUEH;TSAI KAO-TSAI;WANG JONG-BOR |
分类号 |
G03F1/08;G03F1/00;G03F1/14;G03F1/30;G03F1/68;H01L21/027;(IPC1-7):G03F9/00;G03C5/00 |
主分类号 |
G03F1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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