| 摘要 |
The present invention relates to a composition and a process for preparing a composition that comprises. 1) a film-forming novolak resin wherein the hydrogen atom of a hydroxyl group in the novolak resin is substituted with a napthoquinonediazidosulfonyl (DNQ) group in a proportion of less than 3.0 mol% per hydrogen atom to form a partially esterified novolak resin; 2) at least one photosensitive component present in an amount sufficient to photosensitize the photoresist composition; and 3) at least one solvent.
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