发明名称 Photosensitive material for immersion photolithography
摘要 When rays of light converge inside a photosensitive material at angles larger than 70 degrees, one polarization of the light may fail to produce the desired image contrast in conventional exposure media. This invention describes means of suppressing the effects of the undesired polarization by using a class of photosensitive media that are insensitive to that polarization and more sensitive to the polarization conveying the desired image contrast as well as by means of optical configurations relevant in the context of semiconductor manufacturing using photolithography.
申请公布号 US6977135(B2) 申请公布日期 2005.12.20
申请号 US20040775312 申请日期 2004.02.10
申请人 LEVENSON MARC DAVID 发明人 LEVENSON MARC DAVID
分类号 G03C1/76;G03F7/00;G03F7/004;G03F7/11;G03F7/20;(IPC1-7):G03F7/00 主分类号 G03C1/76
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