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发明名称
Apparatus for sputtering
摘要
申请公布号
KR100537614(B1)
申请公布日期
2005.12.19
申请号
KR20030056427
申请日期
2003.08.14
申请人
发明人
分类号
H01L21/203;(IPC1-7):H01L21/203
主分类号
H01L21/203
代理机构
代理人
主权项
地址
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